Sharp and Semiconductor Energy Laboratory have announced that they have jointly developed a new oxide semiconductor (IGZO)

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Consumer electronics giant Sharp and research organization Semiconductor Energy Laboratory have announced that they have jointly developed a new oxide semiconductor (IGZO) technology with high crystallinity. They have found a new crystalline structure during the development of oxide semiconductors (IGZO) and this crystalline structure is named CAAC (C-Axis Aligned Crystal). The new technology will be used for higher resolution, lower power consuming, and higher performance touch screens as well as thin width LCD displays used in mobile devices such as smartphones.


Sharp IGZO LCD Display, Image Credit: conecti.ca

IGZO technology accords crystallinity in an oxide semiconductor that is composed of indium (In), gallium (Ga) and zinc (Zn). Its smaller thin-film transistors can deliver higher performance than current formless IGZO semiconductors. It is to be accepted for use in LCD displays for mobile devices such as smartphones where all manufacturer is working to increase the screen resolutions. It can also be accepted for use in organic EL displays.

By using this new IGZO technology, the two companies will also be chasing R&D to extend the use of this component in non-display devices and to develop applications other than displays in the future.

Specifications of prototype displays are as follows.

LCD display
Screen size 4.9 inch 6.1 inch
Resolution (pixels) 720 x 1280 2560 x 1600
Pixel density 302 ppi 498 ppi
Envisioned application Smartphones Mobile devices

 

Organic EL display
Screen size 13.5 inch 3.4 inch
Resolution (pixels) 3840 x 2160 (QFHD) 540 x 960
Pixel density 326 ppi 326 ppi
Outstanding feature White OLEDs + RGB color filters Flexible type

The company says the new technology also has benefits including much lower background noise when used in touchscreens, and the ability to create much thinner bezels.

Source: Theverge


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  On June 4, 2012(2 years, 6 months ago.)

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